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Titlebook: Reflection High-Energy Electron Diffraction and Reflection Electron Imaging of Surfaces; P. K. Larsen,P. J. Dobson Book 1988 Plenum Press,

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Inelastic Scattering and Secondary Electron Emission under Resonance Conditions in RHEED from Pt(111sonance” to denote the effect. However, the origin and nature of the resonant states concerned have been clarified only recently. With the aid of model calculations based on a multislice formulation of the RHEED theory [5] it has been shown that these states correspond to the intrinsic bound states
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Adatom Site Determination using Channeling Effects in RHEED on X-ray and Auger Electron Productionffects on backscattered electron production, and their uses to provide image contrast in a UHV scanning reflection electron microscope have also been reported [5]. For a recent analysis of the diffraction conditions required to excite the surface wave resonance condition, the reader is referred to t
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Diffraction from Disordered Surfaces: An Overviewtent here is to provide a simple, physically reasonable, pedagogical approach to this subject.[1] We somewhat artificially divide the paper into static phenomena (Sec. II), time-dependent phenomena (Sec. III), and (Sec. IV) issues that complicate the simple picture presented in Secs. II and III. In
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Book 1988able, RHEED was the dominating electron diffraction technique. Since then and until recently the method of Low Energy Electron Diffraction (LEED) largely surpassed RHEED in popularity in surface studies. The two methods are closely related of course, each with its own specific advantages. The grazin
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ually have two subsets namely Type A1, Type A2, Type B1, and Type B2. The insertion impedance by Type A1 and Type B1 into the system is linear during fault conditions, whereas the nonlinear impedance is provided by Type A2 and Type B2 FCLs. This issue can be graphically illustrated with the help of
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ssee Eastman plant simulator - demonstrating the strengths and weaknesses of each approach in detail. This aids the reader in selecting the right method for his process application. Plant simulator and homework problems in which students apply the process monitoring techniques to a non-trivial simul
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