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Titlebook: Optical Constants of Crystalline and Amorphous Semiconductors; Numerical Data and G Sadao Adachi Book 1999 Springer Science+Business Media

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楼主: 古生物学
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Sadao Adachigruppe führt dazu, daß belastetes Bodenmaterial oral aufgenommen werden kann. Die Spielplatzerlasse in Nordrhein-Westfalen (Kramer et al. 1990) und Bayern (AG Umwelthygiene 1994) gehen bei der humantoxikologischen Bewertung von einer Bodeningestion von 1 g/Tag aus. Zu bedenken ist jedoch, daß auf se
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Silicon (Si) it in abundance); however, this element is usually not found free, but mainly in its oxides and silicates. The Czochralski method is commonly used to produce single crystals of Si used for solid-state devices. Crystalline Si has a metallic luster and grayish color, and transmits more than 95% of al
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Gray Tin (α-Sn)into white, or ß-Sn, the ordinary form of the metal (tetragonal structure). Early experiments on α-Sn were performed on lumpy polycrystalline samples obtained by transforming ß-Sn at temperatures below 13°C. In 1958 Ewald and Tufte [1] succeeded in preparing a-Sn single crystals from a saturated mer
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Cubic Silicon Carbide (3C-SiC)s types of SiC differ one from another only by the order in which successive planes of Si (or C) atoms are stacked along the . axis; one polytype is cubic (3C) while the remainder, including two of the more frequently occurring forms, 6H and 15R, possess uniaxial symmetry. Note that in the polytype
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Carbon-Incorporated Alloys (SI,C,, SI,GE,C,, etc.)ircuit technology [1,2]. For a variety of technical reasons, in particular to adjust the strain in the het-eroepitaxial layers, it is desirable to adjust the stain in the group-IV materials and form alloys (., Si.C., and Si.Ge.C.). For the Si-Ge system, the bond-length mismatch is only 4%, whereas i
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Cubic Boron Nitride (,-BN) properties like extreme hardness, high melting point, high thermal conductivity, large band-gap energy, low dielectric constant, and high chemical stability. If the problems of crystal growth are solved, it will become an important material for many industrial applications.
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Aluminum Nitride (AIN)(∼∣2−5∣×10. cm/V at 300 K) (see Ref. [1]). AIN has also excellent insulator and passivation properties, low dispersion of permittivity, and low dielectric loss. These make it useful for numerous device applications (see, ., Ref. [2]).
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