书目名称 | Metal-Dielectric Interfaces in Gigascale Electronics |
副标题 | Thermal and Electric |
编辑 | Ming He,Toh-Ming Lu |
视频video | |
概述 | Presents a unified approach to understanding the diverse phenomena observed at metal-dielectric interfaces.Features fundamental considerations in the physics and chemistry of metal-dielectric interact |
丛书名称 | Springer Series in Materials Science |
图书封面 |  |
描述 | .Metal-dielectric interfaces are ubiquitous in modern electronics. As advanced gigascale electronic devices continue to shrink, the stability of these interfaces is becoming an increasingly important issue that has a profound impact on the operational reliability of these devices. In this book, the authors present the basic science underlying the thermal and electrical stability of metal-dielectric interfaces and its relationship to the operation of advanced interconnect systems in gigascale electronics. Interface phenomena, including chemical reactions between metals and dielectrics, metallic-atom diffusion, and ion drift, are discussed based on fundamental physical and chemical principles. Schematic diagrams are provided throughout the book to illustrate interface phenomena and the principles that govern them. .Metal-Dielectric Interfaces in Gigascale Electronics. provides a unifying approach to the diverse and sometimes contradictory test results that are reported in the literature on metal-dielectric interfaces. The goal is to provide readers with a clear account of the relationship between interface science and its applications in interconnect structures. The material prese |
出版日期 | Book 2012 |
关键词 | Cu interconnect technology; Flatband voltage shifts in metal-dielectric-; Fundamental science metal-di |
版次 | 1 |
doi | https://doi.org/10.1007/978-1-4614-1812-2 |
isbn_softcover | 978-1-4939-4308-1 |
isbn_ebook | 978-1-4614-1812-2Series ISSN 0933-033X Series E-ISSN 2196-2812 |
issn_series | 0933-033X |
copyright | Springer Science+Business Media, LLC 2012 |