找回密码
 To register

QQ登录

只需一步,快速开始

扫一扫,访问微社区

Titlebook: Computer-Aided Design and VLSI Device Development; Kit Man Cham,Soo-Young Oh,Daeje Chin Book 1988Latest edition Kluwer Academic Publishers

[复制链接]
楼主: interminable
发表于 2025-3-30 10:30:14 | 显示全部楼层
发表于 2025-3-30 12:58:52 | 显示全部楼层
发表于 2025-3-30 18:27:05 | 显示全部楼层
The Surface Inversion Problem in Trench Isolated CMOSr transistor gain will be reduced, thereby increasing the latchup initiating current. In a p-well process, the reduction of latchup sensitivity is achieved from reduction of the lateral parasitic p-n-p current gain.
发表于 2025-3-30 21:58:00 | 显示全部楼层
发表于 2025-3-31 02:36:50 | 显示全部楼层
Book 1988Latest editionaid of numerical simulations. Solutions to these problems are presented. Issues in state-of-the-art device development such as drain-induced barrier lowering, trench isolation, hot elec­ tron effects, device scaling and interconnect parasitics are discussed. In this second edition, two new chapters
发表于 2025-3-31 07:50:35 | 显示全部楼层
0893-3405 barrier lowering, trench isolation, hot elec­ tron effects, device scaling and interconnect parasitics are discussed. In this second edition, two new chapters 978-1-4612-8956-2978-1-4613-1695-4Series ISSN 0893-3405
发表于 2025-3-31 10:02:52 | 显示全部楼层
发表于 2025-3-31 15:21:47 | 显示全部楼层
发表于 2025-3-31 17:52:54 | 显示全部楼层
发表于 2025-4-1 00:23:35 | 显示全部楼层
 关于派博传思  派博传思旗下网站  友情链接
派博传思介绍 公司地理位置 论文服务流程 影响因子官网 SITEMAP 大讲堂 北京大学 Oxford Uni. Harvard Uni.
发展历史沿革 期刊点评 投稿经验总结 SCIENCEGARD IMPACTFACTOR 派博系数 清华大学 Yale Uni. Stanford Uni.
|Archiver|手机版|小黑屋| 派博传思国际 ( 京公网安备110108008328) GMT+8, 2025-6-28 12:31
Copyright © 2001-2015 派博传思   京公网安备110108008328 版权所有 All rights reserved
快速回复 返回顶部 返回列表