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Titlebook: Band Structure Engineering in Semiconductor Microstructures; R. A. Abram,M. Jaros Book 1989 Springer Science+Business Media New York 1989

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E. Muschelknautz,G. Hägele,U. Muschelknautz two crystals forming the interface. Small changes, up to 0.3eV, can be introduced, however, in the barriers by means of adequate intralayers deposited at the interface. This opens interesting applications from the point of view of the band structure engineering in semiconductor microstructures.
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Normen auf dem Gebiete der Wasserversorgungstributions ≈ 35 meV wide, with a mean free path of about 14 nm. Resonances in the injection currents, resulting from quantum interference effects of the ballistic holes, are used to support the light nature of the ballistic holes.
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Comments on “Can Band Offsets be Changed Controllably?”dipole can be changed by atomic scale control of the chemical composition at the interface. The primary conclusion is that significant variations appear possible by the dipoles due to oriented pairs of polar atoms at the interface. Conditions where this can occur are discussed.
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Electronic Properties of Semiconductor Interfaces: The Control of Interface Barriers two crystals forming the interface. Small changes, up to 0.3eV, can be introduced, however, in the barriers by means of adequate intralayers deposited at the interface. This opens interesting applications from the point of view of the band structure engineering in semiconductor microstructures.
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Observation of Ballistic Holesstributions ≈ 35 meV wide, with a mean free path of about 14 nm. Resonances in the injection currents, resulting from quantum interference effects of the ballistic holes, are used to support the light nature of the ballistic holes.
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Electronic Properties of Semiconductor Interfaces: The Control of Interface Barrierstheoretical results presented in this communication suggest that the semiconductor heights are basically determined by the intrinsic properties of the two crystals forming the interface. Small changes, up to 0.3eV, can be introduced, however, in the barriers by means of adequate intralayers deposite
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