武士精神 发表于 2025-3-21 18:47:56

书目名称Metallization and Metal-Semiconductor Interfaces影响因子(影响力)<br>        http://figure.impactfactor.cn/if/?ISSN=BK0631550<br><br>        <br><br>书目名称Metallization and Metal-Semiconductor Interfaces影响因子(影响力)学科排名<br>        http://figure.impactfactor.cn/ifr/?ISSN=BK0631550<br><br>        <br><br>书目名称Metallization and Metal-Semiconductor Interfaces网络公开度<br>        http://figure.impactfactor.cn/at/?ISSN=BK0631550<br><br>        <br><br>书目名称Metallization and Metal-Semiconductor Interfaces网络公开度学科排名<br>        http://figure.impactfactor.cn/atr/?ISSN=BK0631550<br><br>        <br><br>书目名称Metallization and Metal-Semiconductor Interfaces被引频次<br>        http://figure.impactfactor.cn/tc/?ISSN=BK0631550<br><br>        <br><br>书目名称Metallization and Metal-Semiconductor Interfaces被引频次学科排名<br>        http://figure.impactfactor.cn/tcr/?ISSN=BK0631550<br><br>        <br><br>书目名称Metallization and Metal-Semiconductor Interfaces年度引用<br>        http://figure.impactfactor.cn/ii/?ISSN=BK0631550<br><br>        <br><br>书目名称Metallization and Metal-Semiconductor Interfaces年度引用学科排名<br>        http://figure.impactfactor.cn/iir/?ISSN=BK0631550<br><br>        <br><br>书目名称Metallization and Metal-Semiconductor Interfaces读者反馈<br>        http://figure.impactfactor.cn/5y/?ISSN=BK0631550<br><br>        <br><br>书目名称Metallization and Metal-Semiconductor Interfaces读者反馈学科排名<br>        http://figure.impactfactor.cn/5yr/?ISSN=BK0631550<br><br>        <br><br>

conscience 发表于 2025-3-21 23:03:58

0258-1221 the Technical University of Munich, Garching, W. Germany from 22-26 August 1988. The major focus of the workshop was to evaluate critically the progress made in the area of metal-semiconductor interfaces. The underlying theme was the mechanism of Schottky barrier formation and a serious as­ sessment

Irritate 发表于 2025-3-22 01:48:35

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Servile 发表于 2025-3-22 07:09:14

Electrical Characterization of Interface States at Schottky Contacts and MIS Tunnel Diodesn,. interface dislocations,. or a combination of these effects. Deviations from the Schottky model2 are then understandable on the basis of trapped interface charge which maintains a dipole at the interface between the metal and the semiconductor..

沟通 发表于 2025-3-22 12:18:38

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Musculoskeletal 发表于 2025-3-22 14:51:24

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CESS 发表于 2025-3-22 18:10:40

Structures and Electronic Properties of Epitaxial Silicon-Silicide Interfacesy of the electronic properties of these interfaces at a level not possible for other metal-semiconductor systems. These Schottky-barrier systems are on a par with, or perhaps better than, molecular-beam-epitaxy-grown semiconductor heterostructures in their degree of perfection.

废墟 发表于 2025-3-22 23:14:11

e cell. In the last few years, direct RNA nanopore sequencing (dRNA-seq) has emerged as a promising technology that can provide single-molecule resolution maps of RNA modifications in their native RNA context. While native RNA can be successfully sequenced using this technology, the detection of RNA

利用 发表于 2025-3-23 03:42:35

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jagged 发表于 2025-3-23 07:19:07

e cell. In the last few years, direct RNA nanopore sequencing (dRNA-seq) has emerged as a promising technology that can provide single-molecule resolution maps of RNA modifications in their native RNA context. While native RNA can be successfully sequenced using this technology, the detection of RNA
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查看完整版本: Titlebook: Metallization and Metal-Semiconductor Interfaces; Inder P. Batra Book 1989 Plenum Press, New York 1989 Doping.Metall.Semiconductor.Tunnel