指责
发表于 2025-3-21 17:06:30
书目名称Lecture Notes on Principles of Plasma Processing影响因子(影响力)<br> http://impactfactor.cn/2024/if/?ISSN=BK0583426<br><br> <br><br>书目名称Lecture Notes on Principles of Plasma Processing影响因子(影响力)学科排名<br> http://impactfactor.cn/2024/ifr/?ISSN=BK0583426<br><br> <br><br>书目名称Lecture Notes on Principles of Plasma Processing网络公开度<br> http://impactfactor.cn/2024/at/?ISSN=BK0583426<br><br> <br><br>书目名称Lecture Notes on Principles of Plasma Processing网络公开度学科排名<br> http://impactfactor.cn/2024/atr/?ISSN=BK0583426<br><br> <br><br>书目名称Lecture Notes on Principles of Plasma Processing被引频次<br> http://impactfactor.cn/2024/tc/?ISSN=BK0583426<br><br> <br><br>书目名称Lecture Notes on Principles of Plasma Processing被引频次学科排名<br> http://impactfactor.cn/2024/tcr/?ISSN=BK0583426<br><br> <br><br>书目名称Lecture Notes on Principles of Plasma Processing年度引用<br> http://impactfactor.cn/2024/ii/?ISSN=BK0583426<br><br> <br><br>书目名称Lecture Notes on Principles of Plasma Processing年度引用学科排名<br> http://impactfactor.cn/2024/iir/?ISSN=BK0583426<br><br> <br><br>书目名称Lecture Notes on Principles of Plasma Processing读者反馈<br> http://impactfactor.cn/2024/5y/?ISSN=BK0583426<br><br> <br><br>书目名称Lecture Notes on Principles of Plasma Processing读者反馈学科排名<br> http://impactfactor.cn/2024/5yr/?ISSN=BK0583426<br><br> <br><br>
朋党派系
发表于 2025-3-21 21:35:19
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营养
发表于 2025-3-22 00:43:14
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Chivalrous
发表于 2025-3-22 08:03:45
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decode
发表于 2025-3-22 08:56:43
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CLEFT
发表于 2025-3-22 13:29:11
ECR Sources,5 GHz. Both the large magnetic field of 875G and the microwave waveguide plumbing make these reactors more complicated and expensive than RIE reactors. Unless one uses tricky methods that depend on nonuniform magnetic fields and densities, microwaves cannot penetrate into a plasma if ω. > ω. Aτ 2.45
AND
发表于 2025-3-22 20:15:36
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流利圆滑
发表于 2025-3-22 23:13:49
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空中
发表于 2025-3-23 04:41:18
Discharge Equilibrium,roducing the right mixture of chemical species and the energy and flux of ions onto the substrate. For some processes, such as cleaning and stripping, simply a high density of oxygen would do; but for the more delicate etching processes, the proper equilibrium conditions are crucial. Reactor-scale n
激励
发表于 2025-3-23 07:52:11
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