Maudlin 发表于 2025-3-21 17:41:53

书目名称Hot-Carrier Reliability of MOS VLSI Circuits影响因子(影响力)<br>        http://figure.impactfactor.cn/if/?ISSN=BK0428461<br><br>        <br><br>书目名称Hot-Carrier Reliability of MOS VLSI Circuits影响因子(影响力)学科排名<br>        http://figure.impactfactor.cn/ifr/?ISSN=BK0428461<br><br>        <br><br>书目名称Hot-Carrier Reliability of MOS VLSI Circuits网络公开度<br>        http://figure.impactfactor.cn/at/?ISSN=BK0428461<br><br>        <br><br>书目名称Hot-Carrier Reliability of MOS VLSI Circuits网络公开度学科排名<br>        http://figure.impactfactor.cn/atr/?ISSN=BK0428461<br><br>        <br><br>书目名称Hot-Carrier Reliability of MOS VLSI Circuits被引频次<br>        http://figure.impactfactor.cn/tc/?ISSN=BK0428461<br><br>        <br><br>书目名称Hot-Carrier Reliability of MOS VLSI Circuits被引频次学科排名<br>        http://figure.impactfactor.cn/tcr/?ISSN=BK0428461<br><br>        <br><br>书目名称Hot-Carrier Reliability of MOS VLSI Circuits年度引用<br>        http://figure.impactfactor.cn/ii/?ISSN=BK0428461<br><br>        <br><br>书目名称Hot-Carrier Reliability of MOS VLSI Circuits年度引用学科排名<br>        http://figure.impactfactor.cn/iir/?ISSN=BK0428461<br><br>        <br><br>书目名称Hot-Carrier Reliability of MOS VLSI Circuits读者反馈<br>        http://figure.impactfactor.cn/5y/?ISSN=BK0428461<br><br>        <br><br>书目名称Hot-Carrier Reliability of MOS VLSI Circuits读者反馈学科排名<br>        http://figure.impactfactor.cn/5yr/?ISSN=BK0428461<br><br>        <br><br>

perjury 发表于 2025-3-21 20:35:00

Oxide Degradation Mechanisms in MOS Transistors,he drain. The “damage” is in the form of localized oxide charge trapping and/or interface trap generation, which gradually builds up and permanently changes the oxide-interface charge distribution ,. In this chapter, the hot-carrier injection mechanisms leading to oxide damage in MOSFET device

Lice692 发表于 2025-3-22 01:54:20

Modeling of Degradation Mechanisms,ion models developed for estimating the hot-carrier induced oxide degradation will be presented. The physical degradation models include all of the significant mechanisms, i.e., electron and hole trapping, interface trap generation by electron injection and interface trap generation by hole injectio

amputation 发表于 2025-3-22 06:00:55

http://reply.papertrans.cn/43/4285/428461/428461_4.png

无孔 发表于 2025-3-22 09:29:59

http://reply.papertrans.cn/43/4285/428461/428461_5.png

incite 发表于 2025-3-22 13:10:21

Fast Timing Simulation for Circuit Reliability,VLSI chips increases with shrinking design rules. The development and use of . reliability simulation tools are therefore crucial for early assessment and improvement of circuit lifetime. Various approaches for modeling and estimating the hot-carrier related degradation of MOS transistors, based on

腐蚀 发表于 2025-3-22 20:08:45

http://reply.papertrans.cn/43/4285/428461/428461_7.png

阻挠 发表于 2025-3-23 00:09:26

Circuit Design for Reliability,s chapters. The development and use of accurate reliability simulation tools were recognized as crucial measures for early assessment and improvement of circuit reliability. Once the long-term reliability of the circuit is estimated through simulation, the results can be compared with predetermined

Customary 发表于 2025-3-23 04:11:08

When blockchain technology and AI are coupled, fraud, identity theft, and data breaches are reduced, while financial transactions are seen as more trustworthy and legal. This abstract examines the potential synergies between blockchain technology and AI, as well as the uses, benefits, and combined

隐藏 发表于 2025-3-23 05:44:46

http://reply.papertrans.cn/43/4285/428461/428461_10.png
页: [1] 2 3 4 5
查看完整版本: Titlebook: Hot-Carrier Reliability of MOS VLSI Circuits; Yusuf Leblebici,Sung-Mo (Steve) Kang Book 1993 Springer Science+Business Media New York 1993