哥哥大傻瓜 发表于 2025-3-21 16:27:20

书目名称Electromigration Inside Logic Cells影响因子(影响力)<br>        http://figure.impactfactor.cn/if/?ISSN=BK0306076<br><br>        <br><br>书目名称Electromigration Inside Logic Cells影响因子(影响力)学科排名<br>        http://figure.impactfactor.cn/ifr/?ISSN=BK0306076<br><br>        <br><br>书目名称Electromigration Inside Logic Cells网络公开度<br>        http://figure.impactfactor.cn/at/?ISSN=BK0306076<br><br>        <br><br>书目名称Electromigration Inside Logic Cells网络公开度学科排名<br>        http://figure.impactfactor.cn/atr/?ISSN=BK0306076<br><br>        <br><br>书目名称Electromigration Inside Logic Cells被引频次<br>        http://figure.impactfactor.cn/tc/?ISSN=BK0306076<br><br>        <br><br>书目名称Electromigration Inside Logic Cells被引频次学科排名<br>        http://figure.impactfactor.cn/tcr/?ISSN=BK0306076<br><br>        <br><br>书目名称Electromigration Inside Logic Cells年度引用<br>        http://figure.impactfactor.cn/ii/?ISSN=BK0306076<br><br>        <br><br>书目名称Electromigration Inside Logic Cells年度引用学科排名<br>        http://figure.impactfactor.cn/iir/?ISSN=BK0306076<br><br>        <br><br>书目名称Electromigration Inside Logic Cells读者反馈<br>        http://figure.impactfactor.cn/5y/?ISSN=BK0306076<br><br>        <br><br>书目名称Electromigration Inside Logic Cells读者反馈学科排名<br>        http://figure.impactfactor.cn/5yr/?ISSN=BK0306076<br><br>        <br><br>

埋伏 发表于 2025-3-21 20:37:45

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Predigest 发表于 2025-3-22 02:37:17

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micronutrients 发表于 2025-3-22 07:03:15

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prodrome 发表于 2025-3-22 08:54:22

Unterhaltende Handfertigkeiten,rom the NANGATE 45 nm cell library down to 22 nm. While this may not strictly obey all design rules at a 22 nm node, the transistor and wire sizes are comparable to 22 nm libraries, and so are the currents. The layout parasitic extraction was done using the 45 nm FreePDK (FreePDK45 .) models and the Calibre xRC (Mentor .) tool.

弯曲的人 发表于 2025-3-22 14:08:59

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弯曲的人 发表于 2025-3-22 17:24:37

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改变 发表于 2025-3-22 23:20:12

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地壳 发表于 2025-3-23 02:21:40

https://doi.org/10.1007/978-981-19-6095-6apter the EM effects on these nets are analyzed for six different metal layers and three different wire lengths, 100, 200, and 300 μm in 22 nm technology. The layouts are constructed considering the 45 nm technology and scaled to 22 nm technology.

群岛 发表于 2025-3-23 06:37:19

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查看完整版本: Titlebook: Electromigration Inside Logic Cells; Modeling, Analyzing Gracieli Posser,Sachin S. Sapatnekar,Ricardo Reis Book 2017 Springer Internationa