PEL 发表于 2025-3-21 18:51:00
书目名称Dry Etching for VLSI影响因子(影响力)<br> http://figure.impactfactor.cn/if/?ISSN=BK0283256<br><br> <br><br>书目名称Dry Etching for VLSI影响因子(影响力)学科排名<br> http://figure.impactfactor.cn/ifr/?ISSN=BK0283256<br><br> <br><br>书目名称Dry Etching for VLSI网络公开度<br> http://figure.impactfactor.cn/at/?ISSN=BK0283256<br><br> <br><br>书目名称Dry Etching for VLSI网络公开度学科排名<br> http://figure.impactfactor.cn/atr/?ISSN=BK0283256<br><br> <br><br>书目名称Dry Etching for VLSI被引频次<br> http://figure.impactfactor.cn/tc/?ISSN=BK0283256<br><br> <br><br>书目名称Dry Etching for VLSI被引频次学科排名<br> http://figure.impactfactor.cn/tcr/?ISSN=BK0283256<br><br> <br><br>书目名称Dry Etching for VLSI年度引用<br> http://figure.impactfactor.cn/ii/?ISSN=BK0283256<br><br> <br><br>书目名称Dry Etching for VLSI年度引用学科排名<br> http://figure.impactfactor.cn/iir/?ISSN=BK0283256<br><br> <br><br>书目名称Dry Etching for VLSI读者反馈<br> http://figure.impactfactor.cn/5y/?ISSN=BK0283256<br><br> <br><br>书目名称Dry Etching for VLSI读者反馈学科排名<br> http://figure.impactfactor.cn/5yr/?ISSN=BK0283256<br><br> <br><br>鸣叫 发表于 2025-3-21 20:57:30
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https://doi.org/10.1007/978-3-030-36766-4ng. In fact, certain diagnostic methods are a prerequisite for precise control of etching processes. Over the years a large number of techniques have been developed; these usually require some in situ “sensor” to measure the etch rates or to detect the endpoint when a film has been etched through to expose the underlying material.夹死提手势 发表于 2025-3-22 10:45:01
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The Plasma State,remely low, namely about 10. at room temperature. Not much, but it is there, and room-temperature air is certainly not a plasma. A useful definition for the plasma state has been postulated by Chen ,MEN 发表于 2025-3-23 07:08:20
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