诽谤
发表于 2025-3-27 00:49:50
Anna Budzanowska,Tomasz Pietrzykowskivery 3 years, and logic devices and flash memory products, with 32-nm-level minimum feature sizes, were in volume production as of 2011. Some 28-nm production devices are also available as of this writing.
死亡率
发表于 2025-3-27 02:09:51
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现代
发表于 2025-3-27 08:12:59
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FACT
发表于 2025-3-27 13:11:47
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APNEA
发表于 2025-3-27 17:07:51
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Postulate
发表于 2025-3-27 19:38:08
https://doi.org/10.1007/978-3-030-36460-1ious issue at the 32-nm node and beyond. Furthermore, the discussion includes a review of the double-patterning technology, which is the hot topic of the moment, and three-dimensional integrated circuit (3D IC) etching for the 16-nm node and beyond.
压倒
发表于 2025-3-27 22:09:22
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感染
发表于 2025-3-28 06:10:43
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ILEUM
发表于 2025-3-28 09:34:33
10楼
Outshine
发表于 2025-3-28 12:55:38
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