小平面
发表于 2025-3-25 04:49:16
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间接
发表于 2025-3-25 11:18:31
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Brochure
发表于 2025-3-25 12:44:41
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Root494
发表于 2025-3-25 17:53:33
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丰满中国
发表于 2025-3-25 23:07:15
Kazuo NojiriProvides a comprehensive, systematic guide to dry etching technologies, from basics to latest technologies.Enables beginners to understand the mechanisms of dry etching, without complexities of numeri
侵蚀
发表于 2025-3-26 01:32:01
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CLASP
发表于 2025-3-26 07:46:14
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和平
发表于 2025-3-26 11:59:31
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ORE
发表于 2025-3-26 16:36:54
Latest Dry Etching Technologies,ious issue at the 32-nm node and beyond. Furthermore, the discussion includes a review of the double-patterning technology, which is the hot topic of the moment, and three-dimensional integrated circuit (3D IC) etching for the 16-nm node and beyond.
浸软
发表于 2025-3-26 17:47:23
Book 2015her miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers an