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发表于 2025-3-21 16:22:46
书目名称Chemical Vapor Deposition影响因子(影响力)<br> http://impactfactor.cn/2024/if/?ISSN=BK0224462<br><br> <br><br>书目名称Chemical Vapor Deposition影响因子(影响力)学科排名<br> http://impactfactor.cn/2024/ifr/?ISSN=BK0224462<br><br> <br><br>书目名称Chemical Vapor Deposition网络公开度<br> http://impactfactor.cn/2024/at/?ISSN=BK0224462<br><br> <br><br>书目名称Chemical Vapor Deposition网络公开度学科排名<br> http://impactfactor.cn/2024/atr/?ISSN=BK0224462<br><br> <br><br>书目名称Chemical Vapor Deposition被引频次<br> http://impactfactor.cn/2024/tc/?ISSN=BK0224462<br><br> <br><br>书目名称Chemical Vapor Deposition被引频次学科排名<br> http://impactfactor.cn/2024/tcr/?ISSN=BK0224462<br><br> <br><br>书目名称Chemical Vapor Deposition年度引用<br> http://impactfactor.cn/2024/ii/?ISSN=BK0224462<br><br> <br><br>书目名称Chemical Vapor Deposition年度引用学科排名<br> http://impactfactor.cn/2024/iir/?ISSN=BK0224462<br><br> <br><br>书目名称Chemical Vapor Deposition读者反馈<br> http://impactfactor.cn/2024/5y/?ISSN=BK0224462<br><br> <br><br>书目名称Chemical Vapor Deposition读者反馈学科排名<br> http://impactfactor.cn/2024/5yr/?ISSN=BK0224462<br><br> <br><br>
Override
发表于 2025-3-22 00:14:40
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FUSE
发表于 2025-3-22 00:57:35
Manufacturability,process. It provides a framework to increase the efficiency with which processes can be made manufacturable. I believe this framework should be a prerequisite for all process/equipment engineers who hope to work in the microelectronic industry.
Coma704
发表于 2025-3-22 08:28:35
Chemical Equilibrium and Kinetics,. This reaction is usually endothermic and the energy needed for the forward progress of this reaction can come from many sources: thermal, electrical plasmas, photons, etc. The earliest and most common means of supplying energy to the CVD reaction is by heating the substrate and this technique is c
残暴
发表于 2025-3-22 12:36:33
Reactor Design for Thermal CVD,products. We will treat this subject with a narrower focus: thin films with desired properties from gaseous sources. Such a discussion may be insufficient for the design of a commercial reactor from first principles. However, for the modification of an existing reactor for the purpose of tailoring f
esthetician
发表于 2025-3-22 14:22:16
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esthetician
发表于 2025-3-22 19:27:17
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慢跑
发表于 2025-3-23 00:34:38
CVD of Conductors,As device dimensions and film thicknesses scale down, thin film properties of conductors (see Chapter 2) begin to dominate and special processing conditions become necessary. For instance, it becomes essential to lower the processing temperature so as to minimize undesirable thermally activated proc
Painstaking
发表于 2025-3-23 04:16:54
CVD of Dielectrics,s are more varied when compared to the applications of conductors. Silicon-based integrated circuit technology owes its popularity in no small measure to the existence of a stable native dielectric, SiO.. SiO. is used as the gate oxide in MOS devices, where it dictates their performance. Dielectrics
Postulate
发表于 2025-3-23 06:59:34
CVD of Semiconductors,n theory, the growth of single-crystal thin films to match the substrate lattice, or epitaxy, is possible through most common methods of thin film deposition, such as evaporation, PVD, and CVD. However, CVD, liquid phase epitaxy and molecular beam epitaxy are the most commonly used methods of epitax