Hyperplasia 发表于 2025-3-23 11:15:15

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保全 发表于 2025-3-23 17:32:31

Trench Isolation Schemes for Bipolar Devices: Benefits and Limiting Aspects,lation techniques have realized not only a high packing density but also reduced collector-substrate, wiring-substrate and base- collector parasitic capacitances. By using these techniques, high performance bipolar devices such as ultra-high-speed ECL RAMs, gate arrays and microprocessors have been

易于交谈 发表于 2025-3-23 21:31:27

A Salicide Base Contact Technology (SCOT) for Use in High Speed Bipolar VLSI, high performance prescaler IC and high-gate-density master- slice LSI. The main feature of this process, for reduction of both the base resistance and the capacitance, is the silicidation of the base contact which is opened by employing self-alignment technology. A 1/128, 1/129 two-modulus prescale

流出 发表于 2025-3-23 22:50:27

Advanced Self-Alignment Technologies and Resulting Structures of High-Speed Bipolar transistors,echnology. High cutoff frequencies of 14 GHz in the downward-mode and 4 GHz in the upward-mode operations have been obtained. Using these transistors, high-speed circuits are constructed and their excellent performance is nearly equal to that of GaAs devices. Other high-speed transistor structures a

Entirety 发表于 2025-3-24 02:25:58

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Heresy 发表于 2025-3-24 09:02:04

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黄油没有 发表于 2025-3-24 12:33:52

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negotiable 发表于 2025-3-24 15:04:11

Self-Aligning Technology for Sub-100nm Deep Base Junction Transistors,ic base. BSA technology has been successfully combined with the RTA (Rapid Thermal Annealing) technique to fabricate sub-100nm base self-aligned bipolar transistors. The typical BSA transistor has h. = 70, BV. = 7 V and BV. = 3 V. BSA technology is likely to prove extremely useful in future bipolar VLSIs.

committed 发表于 2025-3-24 20:38:42

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MOAT 发表于 2025-3-24 23:52:06

A Salicide Base Contact Technology (SCOT) for Use in High Speed Bipolar VLSI,r IC comprised of 1.5 μm SCOT transistors has been improved to a high operation of 2.1 GHz at 56 mW power dissipation. An ECL 18K-gate masterslice has been developed by a Variable Size Cell (VSC) approach, employing the SCOT process.
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查看完整版本: Titlebook: Ultra-Fast Silicon Bipolar Technology; Ludwig Treitinger,Mitiko Miura-Mattausch Textbook 1988 Springer-Verlag Berlin Heidelberg 1988 VLSI.