deteriorate
发表于 2025-3-21 18:43:20
书目名称Surface Science影响因子(影响力)<br> http://impactfactor.cn/2024/if/?ISSN=BK0882322<br><br> <br><br>书目名称Surface Science影响因子(影响力)学科排名<br> http://impactfactor.cn/2024/ifr/?ISSN=BK0882322<br><br> <br><br>书目名称Surface Science网络公开度<br> http://impactfactor.cn/2024/at/?ISSN=BK0882322<br><br> <br><br>书目名称Surface Science网络公开度学科排名<br> http://impactfactor.cn/2024/atr/?ISSN=BK0882322<br><br> <br><br>书目名称Surface Science被引频次<br> http://impactfactor.cn/2024/tc/?ISSN=BK0882322<br><br> <br><br>书目名称Surface Science被引频次学科排名<br> http://impactfactor.cn/2024/tcr/?ISSN=BK0882322<br><br> <br><br>书目名称Surface Science年度引用<br> http://impactfactor.cn/2024/ii/?ISSN=BK0882322<br><br> <br><br>书目名称Surface Science年度引用学科排名<br> http://impactfactor.cn/2024/iir/?ISSN=BK0882322<br><br> <br><br>书目名称Surface Science读者反馈<br> http://impactfactor.cn/2024/5y/?ISSN=BK0882322<br><br> <br><br>书目名称Surface Science读者反馈学科排名<br> http://impactfactor.cn/2024/5yr/?ISSN=BK0882322<br><br> <br><br>
吹气
发表于 2025-3-21 23:20:50
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干旱
发表于 2025-3-22 03:36:52
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FAR
发表于 2025-3-22 07:56:22
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说笑
发表于 2025-3-22 09:30:54
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半圆凿
发表于 2025-3-22 14:31:18
978-3-642-80283-6Springer-Verlag Berlin Heidelberg 1996
许可
发表于 2025-3-22 17:08:21
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改革运动
发表于 2025-3-22 21:45:06
Recent Progress in Investigation of Luminescent and Electrical Phenomena from Semiconductor Cleavagevage in ambients other than air appears to indicate a signal-shortening effect. Studies of electrical conduction across the crack during cleavage of Si show that voltage pulses up to about 400 mV are produced at cleavage, with currents up to about 5 mA being detected. This is explained in part as du
群岛
发表于 2025-3-23 03:29:50
Studies of Alloy Surfaces by Low-Energy Ion Scattering incident angle dependence associated with shadowing of Ru by Cu confirmed that the first overlayer Cu was in a normal registry position, i.e. there was a continuation of the hep stacking sequence. The second layer Cu atoms have also been determined to be at the fee sites by analysing the shadowing
规范就好
发表于 2025-3-23 05:39:13
The Determination of Adsorbate-Substrate Bonding via UPSrate bonding model. Some techniques which have been of particular value in these procedures are: HF-MO calculations; the use of fractional-difference spectra; the choice of substrate (surface); polarization-dependent ARUPS. Each of these points is illustrated by application to methanethiol (CH.SH) a