暂时别动 发表于 2025-3-25 04:17:20
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From FinFET to Nanosheets and Beyondhile many hurdles have been overcome, especially the lower bandgap and thus higher leakage are still a concern. Next, going 3D seems a straightforward way to continue area scaling. Based on the gate-all-around integration scheme, complementary FET (CFET) where nMOS and pMOS are stacked on top of eacImmunization 发表于 2025-3-25 15:25:52
Advanced Lithographyhe technology of choice for the future and promises to be able to support a further scaling of ICs’ critical size, as required by Moore’s law. In particular, the evolution of EUVL laser sources based on Sn plasmas over the years is described, and their role in the diffusion of the technology is disc杠杆 发表于 2025-3-25 19:50:50
MOS Capacitors, MOS Transistors, and Charge-Transfer Devices CCD and CID, along with some applications, of which the most important are in the field of optical sensing. The architecture of imagers using CCD or CID is illustrated, and different aspects of their performance are analyzed.做方舟 发表于 2025-3-25 20:39:00
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Silicon Power Devicesld the silicon power device market maintain such a large market segment? Rapid technological advancement in silicon power devices has led to improvement in cost performance, which has dampened the motivation to adopt SiC and GaN power devices. In this chapter, the device structure and design conceptObloquy 发表于 2025-3-26 07:59:34
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Book 2023re addressed, followed by the description of novel concept-based semiconductor devices. The last section illustrates the numerical simulation methods ranging from the fabrication processes to the device performances..Each chapter is self-contained, and refers to related topics treated in other chapt公共汽车 发表于 2025-3-26 17:43:31
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