悲伤我
发表于 2025-3-21 17:51:51
书目名称Secondary Ion Mass Spectrometry SIMS IV影响因子(影响力)<br> http://impactfactor.cn/if/?ISSN=BK0863195<br><br> <br><br>书目名称Secondary Ion Mass Spectrometry SIMS IV影响因子(影响力)学科排名<br> http://impactfactor.cn/ifr/?ISSN=BK0863195<br><br> <br><br>书目名称Secondary Ion Mass Spectrometry SIMS IV网络公开度<br> http://impactfactor.cn/at/?ISSN=BK0863195<br><br> <br><br>书目名称Secondary Ion Mass Spectrometry SIMS IV网络公开度学科排名<br> http://impactfactor.cn/atr/?ISSN=BK0863195<br><br> <br><br>书目名称Secondary Ion Mass Spectrometry SIMS IV被引频次<br> http://impactfactor.cn/tc/?ISSN=BK0863195<br><br> <br><br>书目名称Secondary Ion Mass Spectrometry SIMS IV被引频次学科排名<br> http://impactfactor.cn/tcr/?ISSN=BK0863195<br><br> <br><br>书目名称Secondary Ion Mass Spectrometry SIMS IV年度引用<br> http://impactfactor.cn/ii/?ISSN=BK0863195<br><br> <br><br>书目名称Secondary Ion Mass Spectrometry SIMS IV年度引用学科排名<br> http://impactfactor.cn/iir/?ISSN=BK0863195<br><br> <br><br>书目名称Secondary Ion Mass Spectrometry SIMS IV读者反馈<br> http://impactfactor.cn/5y/?ISSN=BK0863195<br><br> <br><br>书目名称Secondary Ion Mass Spectrometry SIMS IV读者反馈学科排名<br> http://impactfactor.cn/5yr/?ISSN=BK0863195<br><br> <br><br>
腐蚀
发表于 2025-3-21 21:59:42
Simulation of Ion Sputtering Process on the Binary Alloyuent atoms to the surface and the ion-enhanced diffusion . The simulation of the sputtering including the segregation and the ion enhanced diffusion with computer has advantage in order to understand the sputtering mechanism of the alloys.
品尝你的人
发表于 2025-3-22 02:13:09
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兽皮
发表于 2025-3-22 06:00:13
Surface Structure of Oxidized Metals Bombarded by Incident Ionsnexplicably on the precision of ion mass spectrometry. However, the mechanism of cone growth is not well revealed. To clarify this, the experiment using 42%Ni-Fe alloy has been carried out in the ion mass analyzer.
受辱
发表于 2025-3-22 08:46:14
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peak-flow
发表于 2025-3-22 12:53:10
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patriot
发表于 2025-3-22 18:30:24
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使饥饿
发表于 2025-3-22 21:47:18
Sputtering and Secondary Ion Yields of Ti-Al Alloys Subjected to Oxygen Ion BombardmentA principal approach to the fundamental understanding of SIMS process requires the accumulation of reliable data. Recently, we determined the yields of sputtering and secondary ion emission of pure metals under oxygen ion bombardment, and found some factors governing fundamental phenomena of SIMS.
Comprise
发表于 2025-3-23 02:20:12
Influence of Alkali Metals on the Negative Secondary Ion Emission from SiliconThe utility of ion implantation to investigate the influence of reactive ions on the secondary ion emission has been demonstrated by COLLIGON and KIRIAKIDES in the case of copper matrix material.
deficiency
发表于 2025-3-23 07:27:55
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