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Introduction to Scanning Probe Lithography,as historically scaled down the size of printed features on ICs because scaling both improves transistor performance and reduces the area that devices occupy. Today the patterning technology employed in manufacturing is photolithography, a process that uses ultraviolet light to define submicron-size灾祸 发表于 2025-3-26 04:12:18
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Resist Exposure Using Field-Emitted Electrons,g SPL , but such work was directed toward creating a single working device suitable for research or exploration. Methods used by these groups suffer from speed constraints and poor repeatability, thus it is unlikely they can be easily extended to large-scale fabrication applications. We sou前兆 发表于 2025-3-26 09:28:16
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