gospel 发表于 2025-3-30 11:15:43
Shaveta,H. M. Maali Ahmed,Rishu Chaujaromprehensively and cross-regionally in the first Open Access.This open access book offers a synthetic reflection on the authors’ fieldwork experiences in seven countries within the framework of ‘Authoritarianism in a Global Age’, a major comparative research project. It responds to the demand for in教唆 发表于 2025-3-30 15:07:32
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High Switching Performance of Novel Heterogeneous Gate Dielectric—Hetero-Material Based Junctionlessunnel field-effect transistor, HD-HJLTFET for analog analysis. In our proposed device, low bandgap material, InAs is used in the source region and higher bandgap material, GaAs is used in the channel and drain region to implement the bandgap engineering at the source to channel interface. Further, a教育学 发表于 2025-3-31 00:23:16
Superior Performance of Gate Workfunction and Gate Dielectric Engineered Trapezoidal FinFET in the PFinFET for achieving improved device performance even in the presence of trap charges. In order to study the characteristics, Poisson’s equation has been solved by employing suitable boundary conditions. It is demonstrated that the device offers improved reliability in presence of trap charges and ephotopsia 发表于 2025-3-31 02:56:50
High-K Biomolecule Sensor Based on L-Shaped Tunnel FETTFETs) in wet environment. This scheme relies on entire removal of vertical oxide arm of L-shaped device in which the biomolecules are captured by the receptors attached to the oxide-semiconductor interface. The dielectric constant of the biomolecules influences current-voltage characteristics of th垄断 发表于 2025-3-31 08:52:07
http://reply.papertrans.cn/64/6333/633217/633217_56.pngpoliosis 发表于 2025-3-31 09:33:15
Interface Trap Charge Analysis of Junctionless Triple Metal Gate High-k Gate All Around Nanowire FEThe impact of different interface trap charges (ITCs) on device performance. The output characteristics, such as transconductance, drain current, total current density, and threshold voltage of proposed device have been examined. All results were authenticated using ‘‘atlas-3D’’ device simulation tooELUC 发表于 2025-3-31 13:20:36
Fin Aspect Ratio Optimization of Novel Junctionless Gate Stack Gate All Around (GS-GAA) FinFET for AGate Stack Gate All Around (GS-GAA) FinFET. Several important electrostatic, analog, and RF parameters have been explored with the help of the SILVACO ATLAS 3D simulator. A reduction in leakage current (I.) and subthreshold swing (SS) has been observed for the high Fin aspect ratio. The I. of the de搜寻 发表于 2025-3-31 18:07:41
http://reply.papertrans.cn/64/6333/633217/633217_59.pngsterilization 发表于 2025-4-1 00:32:20
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