驼峰 发表于 2025-3-21 16:52:33

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发誓放弃 发表于 2025-3-21 20:55:18

978-0-7923-0154-7Kluwer Academic Publishers 1989

Liability 发表于 2025-3-22 04:13:04

Microelectronic Materials and Processes978-94-009-0917-5Series ISSN 0168-132X

subacute 发表于 2025-3-22 08:02:09

NATO Science Series E:http://image.papertrans.cn/m/image/633203.jpg

Explicate 发表于 2025-3-22 11:28:05

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HERE 发表于 2025-3-22 15:03:45

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STEER 发表于 2025-3-22 20:11:17

Silicon Oxidation,Today’s VLSI technology is to a large extent based on the excellent properties of thermally grown silicon dioxide layers. SiO. is used as gate dielectric in MOS devices, as implantation or doping mask, and for device isolation purposes.

Eructation 发表于 2025-3-22 22:40:53

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Recessive 发表于 2025-3-23 01:49:08

Diffusion in Semiconductors,Atomic diffusion processes in semiconductors play an important role in the fabrication of electronic devices in various areas. These areas include:

enmesh 发表于 2025-3-23 06:04:53

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查看完整版本: Titlebook: Microelectronic Materials and Processes; R. A. Levy Book 1989 Kluwer Academic Publishers 1989 Metall.X-Ray.alloy.crystal.semiconductors