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Conference proceedings 1982 Scientific Culture, Erice (Italy) on July 15-27, 1981, the first course of the International School of Solid-State Device Research. This volume contains the School Proceedings: fundamentals as well as up-to-date information on each subject presented by qualified authors. The material covered in thi
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Beam Processing Techniques Applied to Crystal Silicon Substratesand for processing times t > 10. sec, this lower limit being related to the time required for insertion and extraction of the furnace boat which carries the batch of silicon slices to be heat-treated.
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Planar Processing: Silicon Oxidationogy. Some problems concerning the properties and the growth of field oxides will also be addressed. Finally, advanced oxidation techniques such as HCl-oxidation, and high pressure oxidation will be briefly discussed.
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