insular
发表于 2025-3-23 13:10:20
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噱头
发表于 2025-3-23 14:55:45
Advances in Optics and Exposure Devices Employed in Excimer Laser/EUV Lithography,ithography techniques have progressed from ArF immersion to multiple patterning to extreme ultraviolet lithography (EUVL) operating at a wavelength of 13.5 nm. During this period, the first-generation lithography devices were immersion systems and achieved 40 nm resolution through a 1.35 numerical a
APRON
发表于 2025-3-23 19:43:14
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Project
发表于 2025-3-24 00:16:30
Optics for Spatially Tailored Ultrashort Pulse Laser Beam Micro-/Nanoprocessing, performed by passive and active optical components. The passive optical components including refractive optical elements such as ordinary lens, microlens array, cylindrical lens, axicon lens, diffractive optical elements, and apertures are described for specially designed shapes. The active optical
使纠缠
发表于 2025-3-24 06:00:13
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Presbycusis
发表于 2025-3-24 07:28:32
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N防腐剂
发表于 2025-3-24 11:53:21
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无动于衷
发表于 2025-3-24 17:22:11
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热心
发表于 2025-3-24 20:42:02
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Blood-Vessels
发表于 2025-3-25 00:32:51
Laser-Induced Surface Modification for Photovoltaic Device Applications,ntegration, consumer electronic devices such as smartphones, organic light-emitting diodes (OLED), and semiconductor devices and in the area of printed circuit boards. In the area of photovoltaic device fabrication, lasers are used for microtexturing of surfaces to improve light-trapping properties,