Wilder
发表于 2025-3-21 19:01:13
书目名称Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies影响因子(影响力)<br> http://impactfactor.cn/if/?ISSN=BK0224387<br><br> <br><br>书目名称Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies影响因子(影响力)学科排名<br> http://impactfactor.cn/ifr/?ISSN=BK0224387<br><br> <br><br>书目名称Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies网络公开度<br> http://impactfactor.cn/at/?ISSN=BK0224387<br><br> <br><br>书目名称Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies网络公开度学科排名<br> http://impactfactor.cn/atr/?ISSN=BK0224387<br><br> <br><br>书目名称Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies被引频次<br> http://impactfactor.cn/tc/?ISSN=BK0224387<br><br> <br><br>书目名称Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies被引频次学科排名<br> http://impactfactor.cn/tcr/?ISSN=BK0224387<br><br> <br><br>书目名称Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies年度引用<br> http://impactfactor.cn/ii/?ISSN=BK0224387<br><br> <br><br>书目名称Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies年度引用学科排名<br> http://impactfactor.cn/iir/?ISSN=BK0224387<br><br> <br><br>书目名称Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies读者反馈<br> http://impactfactor.cn/5y/?ISSN=BK0224387<br><br> <br><br>书目名称Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies读者反馈学科排名<br> http://impactfactor.cn/5yr/?ISSN=BK0224387<br><br> <br><br>
Discrete
发表于 2025-3-21 21:43:59
1568-2609 es. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films.
溃烂
发表于 2025-3-22 02:28:20
https://doi.org/10.1007/978-1-349-08114-1ds, the use of the sol-gel processing offers advantages by sufficiently inexpensive film technologies. Additionally, purity and stability of the precursors, homogeneity of mixed precursors, comparably low processing temperatures to transfer gel films into pure inorganic films can be used to generate high-performance thin films.
持久
发表于 2025-3-22 05:47:27
O. B. Alankus,R. D. Hibberd,C. B. Besant-wear layers on mechanical tools. CVD is very versatile and offers good control of film structure and composition, excellent uniformity, and the capability of conformal deposition on highly irregularly shaped surfaces. CVD processes have been reviewed in e.g. refs. [.]-[.].
Debility
发表于 2025-3-22 10:49:24
Meta-learning Improves Emotion Recognitionposition of thin films, exposure or removal of photo-resists, and recrystallization of silicon on insulator substrates [.–.]. The desirability of using a focused laser beam for maskless fabrication and alteration of integrated circuits has also been recognized [.].
古董
发表于 2025-3-22 12:55:37
http://reply.papertrans.cn/23/2244/224387/224387_6.png
古董
发表于 2025-3-22 18:28:42
http://reply.papertrans.cn/23/2244/224387/224387_7.png
correspondent
发表于 2025-3-23 00:33:17
Sol-Gel Deposition Processes of Thin Ceramic Films,ds, the use of the sol-gel processing offers advantages by sufficiently inexpensive film technologies. Additionally, purity and stability of the precursors, homogeneity of mixed precursors, comparably low processing temperatures to transfer gel films into pure inorganic films can be used to generate high-performance thin films.
bile648
发表于 2025-3-23 02:44:07
Numerical Simulation of Flow and Chemistry in Thermal Chemical Vapor Deposition Processes,-wear layers on mechanical tools. CVD is very versatile and offers good control of film structure and composition, excellent uniformity, and the capability of conformal deposition on highly irregularly shaped surfaces. CVD processes have been reviewed in e.g. refs. [.]-[.].
围巾
发表于 2025-3-23 07:19:29
http://reply.papertrans.cn/23/2244/224387/224387_10.png