Dysplasia
发表于 2025-3-28 17:03:20
The Clean and Hydrogen-Terminated (100) and (111) Surfaces of Diamond and Silicon and silicon. The calculations are performed using the SLAB-MINDO method which is an extension of the well-known MINDO/3 molecular orbital method. For the (111) surfaces, both single-bond and triple-bond cleavage is considered. The results are shown to be in good agreement with experiment and highli
在驾驶
发表于 2025-3-28 18:46:55
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ANTI
发表于 2025-3-29 02:29:39
Cleavage Processes and Steps in Semiconductors if the applied forces are not sufficiently strong, supporting models of surface structure which do not feature drastic atomic rearrangements. The steps found on cleaved surfaces have been modelled and the energies calculated for several cases. Results are summarised.
平静生活
发表于 2025-3-29 07:09:33
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entrance
发表于 2025-3-29 11:14:38
Second-Harmonic Generation Applied to the Formation of Ultrathin Organic Films on Inorganic Substratof an adsorbate . and in real time. That SHG is a technique which allows also to discriminate between reactions at the interface and ordering processes occurring during three-dimensional film growth will be demonstrated by experiments on the formation of vapor deposited polyamic acid films on gold and silver substrates.
BIBLE
发表于 2025-3-29 14:38:05
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falsehood
发表于 2025-3-29 17:11:33
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旧石器时代
发表于 2025-3-29 20:27:33
The Clean and Hydrogen-Terminated (100) and (111) Surfaces of Diamond and Silicon the (111) surfaces, both single-bond and triple-bond cleavage is considered. The results are shown to be in good agreement with experiment and highlight several important differences between diamond and silicon surfaces.
Brain-Imaging
发表于 2025-3-30 02:22:49
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TIGER
发表于 2025-3-30 04:38:42
Formation of Zinc Oxide Thin Films by the Thermal Decomposition of Zinc Acetate until a temperature of 350°C is attained. The growth rate of ZnO films (10 — 200 Å in thickness) was dependant on preheated substrate temperatures. Analysis of films that were grown on substrates heated to 400°C were found to contain less than 4% atomic carbon incorporated in the bulk of the films.