deflate
发表于 2025-3-21 19:06:04
书目名称Soft Computing in Industrial Applications影响因子(影响力)<br> http://impactfactor.cn/2024/if/?ISSN=BK0870518<br><br> <br><br>书目名称Soft Computing in Industrial Applications影响因子(影响力)学科排名<br> http://impactfactor.cn/2024/ifr/?ISSN=BK0870518<br><br> <br><br>书目名称Soft Computing in Industrial Applications网络公开度<br> http://impactfactor.cn/2024/at/?ISSN=BK0870518<br><br> <br><br>书目名称Soft Computing in Industrial Applications网络公开度学科排名<br> http://impactfactor.cn/2024/atr/?ISSN=BK0870518<br><br> <br><br>书目名称Soft Computing in Industrial Applications被引频次<br> http://impactfactor.cn/2024/tc/?ISSN=BK0870518<br><br> <br><br>书目名称Soft Computing in Industrial Applications被引频次学科排名<br> http://impactfactor.cn/2024/tcr/?ISSN=BK0870518<br><br> <br><br>书目名称Soft Computing in Industrial Applications年度引用<br> http://impactfactor.cn/2024/ii/?ISSN=BK0870518<br><br> <br><br>书目名称Soft Computing in Industrial Applications年度引用学科排名<br> http://impactfactor.cn/2024/iir/?ISSN=BK0870518<br><br> <br><br>书目名称Soft Computing in Industrial Applications读者反馈<br> http://impactfactor.cn/2024/5y/?ISSN=BK0870518<br><br> <br><br>书目名称Soft Computing in Industrial Applications读者反馈学科排名<br> http://impactfactor.cn/2024/5yr/?ISSN=BK0870518<br><br> <br><br>
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发表于 2025-3-21 20:23:14
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嘲弄
发表于 2025-3-22 03:20:38
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Archipelago
发表于 2025-3-22 10:15:37
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发表于 2025-3-22 13:21:30
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choroid
发表于 2025-3-22 17:18:45
Janos Abonyi,Robert Babuska,Ferenc Szeifert,Lajos Nagy,Henk Verbruggen of similar type. At a later stage of development, tests and inspections were made not only on finished objects, but also on raw materials before manufacture. Direct testing of the object of the workpiece or structural component is still customary today, although since industrialisation, and in part
Flatus
发表于 2025-3-22 21:40:34
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移植
发表于 2025-3-23 04:43:38
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deactivate
发表于 2025-3-23 08:01:35
Mika Sato-Ilicon, and process efficiency in deep ultraviolet, electron-beam, and x-ray lithographies. These characteristics are useful for the fabrication of structures for MEMS applications. In this work, the UVIII resist is characterised for x-ray lithographic applications by studying the “deprotection” or acid