periodontitis
发表于 2025-3-25 04:50:20
Efficient Mask Design for Inverse Lithography Technology Based on 2D Discrete Cosine Transformationo improve the resolution and pattern fidelity in optical microlithography. The patterns on the mask are transformed into frequency space using 2D discrete cosine transformation (DCT). The solution space is thus changed to frequency space from real space. By cutting off high frequency components in D
项目
发表于 2025-3-25 07:28:44
http://reply.papertrans.cn/87/8677/867648/867648_22.png
渗入
发表于 2025-3-25 14:22:25
Comparison of Monte Carlo Transport Models for Nanometer-Size MOSFETs,ation of the I–V characteristics of a 25 nm gate-length MOSFET representative of the high-performance transistor of the 65 nm technology node. Appreciable differences between the simulators are obtained in terms of simulated I.. These differences are mainly related to different treatments of the ion
Nutrient
发表于 2025-3-25 19:21:23
http://reply.papertrans.cn/87/8677/867648/867648_24.png
allergen
发表于 2025-3-25 22:24:33
http://reply.papertrans.cn/87/8677/867648/867648_25.png
勉励
发表于 2025-3-26 02:40:24
Inclusion of the Pauli Principle in the Langevin-Boltzmann Equation for Bulk Systems,uation (LBE) based on a spherical harmonics expansion. The Newton-Raphson scheme for solving the nonlinear BE converges within a few steps and the increase in CPU time is less than a factor of ten. Even in the case of an extremely degenerate electron gas no numerical problems occur. The approach wor
闲逛
发表于 2025-3-26 07:08:57
http://reply.papertrans.cn/87/8677/867648/867648_27.png
开头
发表于 2025-3-26 09:27:34
A Simple Technique for the Monte Carlo Simulation of Transport in Quantum Wells,the proposed technique and existing methods is the use of three dimension momentum (3Dk) particles in the simulation of a quantum region. The use of 3Dk particles within a quantum well structure facilitates the MC simulation of transport in nanoscale devices which contain both the classical and quan
无表情
发表于 2025-3-26 13:38:37
http://reply.papertrans.cn/87/8677/867648/867648_29.png
BILIO
发表于 2025-3-26 19:10:50
Efficient Mask Design for Inverse Lithography Technology Based on 2D Discrete Cosine TransformationC spectrum, the dimension of the solution space is greatly reduced. Using a gradient-based algorithm, we solve the inverse problem in incoherent and partial coherent imaging systems with binary, 6%EPSM and APSM mask. Good fidelity images are achieved.