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Mirko Knoll,Haitham Abbadi,Torben Weisan ap­ preciation of the common features in the response of the various carbon to ion impact, and to become aware of current research oppor­ allotropes tunities978-3-642-77173-6978-3-642-77171-2Series ISSN 0933-033X Series E-ISSN 2196-2812

嘲笑 发表于 2025-3-25 13:47:43

Christopher Auer,Patrick Wüchner,Hermann de Meerg down of ions is treated in the third chapter both analytically and by numerical simulation meth­ ods. Channeling implants are described in some details in vie978-1-4613-5952-4978-1-4615-2259-1Series ISSN 0893-3405

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Peter Merz,Steffen Wolf,Dennis Schwerdel,Matthias Priebe, the graphite phase with strong in-plane trigonal bonding is the stable phase, as indicated by the phase diagram of Fig. 2.1 . Under the application of high pressure and high temperature (which are somewhat reduced when catalyst particles like iron or nickel are used), transformation to the

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Nouha Oualha,Yves Roudierf ion implantation is being adopted by industry. Another important application is the fundamental study of the physical properties of materials. The First Conference on Ion Implantation in Semiconductors was held at Thousand Oaks, California in 1970. The second conference in this series was held at

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查看完整版本: Titlebook: Self-Organizing Systems; Third International Karin Anna Hummel,James P. G. Sterbenz Conference proceedings 2008 Springer-Verlag Berlin Hei