情爱
发表于 2025-3-25 05:45:16
Material Removal Mechanism of Cu in KIO4-Based Slurry, proposed based on the chemical-mechanical synergism theory. The results show that the Cu surface films formed in the slurry are complex and vary considerably as a function of the solution pH. Based on the surface film analysis and CMP experimental results, it can be concluded that the controlling f
mechanical
发表于 2025-3-25 09:17:56
Material Removal Mechanism of Ru in KIO4-Based Slurry, be divided into two parts: the direct dissolution of Ru and the passivation of the surface. The surface chemistry, corrosion and passivation properties of Ru were investigated. On the basis, the CMP and CMP-electrochemical experiments were conducted to fully investigate the underlying mechanism of
有帮助
发表于 2025-3-25 13:18:22
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Embolic-Stroke
发表于 2025-3-25 18:05:54
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积习难改
发表于 2025-3-25 22:33:30
Galvanic Corrosion Inhibitors for Cu/Ru Couple During Chemical Mechanical Polishing of Ru,the oxidant in the polishing slurry. This chapter focuses on the investigation of galvanic corrosion inhibitors (BTA and 1, 2, 4-triazole) for Cu/Ru couple in the KIO.-based solutions. The galvanic corrosion current of Cu was directly measured, and the corrosion inhibition efficiencies (.) were calc
看法等
发表于 2025-3-26 02:44:57
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flourish
发表于 2025-3-26 05:19:12
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cumulative
发表于 2025-3-26 10:19:58
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热情的我
发表于 2025-3-26 12:50:21
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invade
发表于 2025-3-26 20:31:24
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