太平间 发表于 2025-3-21 18:15:40

书目名称Modeling of Chemical Vapor Deposition of Tungsten Films影响因子(影响力)<br>        http://impactfactor.cn/if/?ISSN=BK0636230<br><br>        <br><br>书目名称Modeling of Chemical Vapor Deposition of Tungsten Films影响因子(影响力)学科排名<br>        http://impactfactor.cn/ifr/?ISSN=BK0636230<br><br>        <br><br>书目名称Modeling of Chemical Vapor Deposition of Tungsten Films网络公开度<br>        http://impactfactor.cn/at/?ISSN=BK0636230<br><br>        <br><br>书目名称Modeling of Chemical Vapor Deposition of Tungsten Films网络公开度学科排名<br>        http://impactfactor.cn/atr/?ISSN=BK0636230<br><br>        <br><br>书目名称Modeling of Chemical Vapor Deposition of Tungsten Films被引频次<br>        http://impactfactor.cn/tc/?ISSN=BK0636230<br><br>        <br><br>书目名称Modeling of Chemical Vapor Deposition of Tungsten Films被引频次学科排名<br>        http://impactfactor.cn/tcr/?ISSN=BK0636230<br><br>        <br><br>书目名称Modeling of Chemical Vapor Deposition of Tungsten Films年度引用<br>        http://impactfactor.cn/ii/?ISSN=BK0636230<br><br>        <br><br>书目名称Modeling of Chemical Vapor Deposition of Tungsten Films年度引用学科排名<br>        http://impactfactor.cn/iir/?ISSN=BK0636230<br><br>        <br><br>书目名称Modeling of Chemical Vapor Deposition of Tungsten Films读者反馈<br>        http://impactfactor.cn/5y/?ISSN=BK0636230<br><br>        <br><br>书目名称Modeling of Chemical Vapor Deposition of Tungsten Films读者反馈学科排名<br>        http://impactfactor.cn/5yr/?ISSN=BK0636230<br><br>        <br><br>

Essential 发表于 2025-3-21 20:34:26

http://reply.papertrans.cn/64/6363/636230/636230_2.png

Myosin 发表于 2025-3-22 03:08:08

http://reply.papertrans.cn/64/6363/636230/636230_3.png

Estrogen 发表于 2025-3-22 06:40:19

http://reply.papertrans.cn/64/6363/636230/636230_4.png

征兵 发表于 2025-3-22 11:13:40

Book 1993ese different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which

尾巴 发表于 2025-3-22 16:05:24

http://reply.papertrans.cn/64/6363/636230/636230_6.png

无情 发表于 2025-3-22 20:09:22

Progress in Numerical Simulation for Microelectronicshttp://image.papertrans.cn/m/image/636230.jpg

Tortuous 发表于 2025-3-22 21:39:12

https://doi.org/10.1007/978-3-0348-7741-1development; modeling; optimization; semiconductor

refine 发表于 2025-3-23 05:22:38

978-3-0348-7743-5Springer Basel AG 1993

induct 发表于 2025-3-23 07:53:16

Technological Sustainability: Efficient and Green Process Intensification,e to its cheapness, straightforward scalability, and superior process yields, in a wide area of application fields, such as drinking water disinfection, wastewater remediation, food liquid pasteurization and sterilization, biomass pretreatment, creation of ultra-stable nanoemulsions, and many others
页: [1] 2 3 4
查看完整版本: Titlebook: Modeling of Chemical Vapor Deposition of Tungsten Films; Chris R. Kleijn,Christoph Werner Book 1993 Springer Basel AG 1993 development.mod