Recess
发表于 2025-3-28 17:22:15
Precursors for the Chemical Vapor Deposition of Titanium Disulfide and Titanium Nitride Films,onded compounds in CVD processes, since such species have been widely proposed in film deposition mechanisms.. Herein we describe our recent efforts to prepare precursors to titanium disulfide and titanium nitride films using CVD techniques.