CORE 发表于 2025-3-23 12:41:40
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The Uses of Dual Beam FIB in Microelectronic Failure Analysis,ures and to generate smear-free cross-sections of structures having layers of differing hardnesses is very difficult to do using mechanical techniques; this becomes routine using the dual beam FIB. The dual beam FIB is a must-have tool for cross-sectioning MEMS devices without inducing catastrophic damage.enumaerate 发表于 2025-3-23 18:27:48
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The Focused Ion Beam Instrument,uter. The liquid metal ion source provides the finely focused ion beam that makes possible high lateral resolution removal of material. Five axis motorized eucentric stage motion allows rapid sputtering at various angles to the specimen. The ion beam interaction with organo-metallic species facilitaDIS 发表于 2025-3-24 02:58:52
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High Resolution Live Imaging of FIB Milling Processes for Optimum Accuracy,erials science related applications. Through the combination of the Gemini ultrahigh resolution field emission SEM column and the Canion31+ high performance FIB column a wide field of applications can be accessed. This includes structural cross-sections for SEM and transmission electron microscopy (开头 发表于 2025-3-25 00:35:57
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