大炮
发表于 2025-3-25 03:34:02
Plasma Reactor Modeling,rs” is desirable and indeed essential to reduce design cycle and costs. This goal has three elements: reactor scale model, feature level model, and database of physical/chemical properties. With these elements coupled, the complete simulation package should function as a design aid in a TCAD environment.
捐助
发表于 2025-3-25 07:50:05
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botany
发表于 2025-3-25 12:44:08
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Hallowed
发表于 2025-3-25 19:29:39
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freight
发表于 2025-3-25 21:13:00
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Acquired
发表于 2025-3-26 01:30:14
https://doi.org/10.1007/978-3-642-56989-0Plasma; Sensor; Technologie; chemistry; collision; database; development; microelectromechanical system (ME
轮流
发表于 2025-3-26 04:23:23
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聚集
发表于 2025-3-26 09:36:05
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摇曳
发表于 2025-3-26 15:02:03
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亲爱
发表于 2025-3-26 19:42:34
https://doi.org/10.1007/978-3-642-76011-2ted via etch rate measurements and etched feature profile measurements. Despite the time consumption involved in such efforts, much has been learned about the interactions of the multiple control variables of modern etching reactors and the general understanding of plasma etch processing has been ad