拖累
发表于 2025-3-21 19:31:03
书目名称Design for Manufacturability and Yield for Nano-Scale CMOS影响因子(影响力)<br> http://figure.impactfactor.cn/if/?ISSN=BK0268643<br><br> <br><br>书目名称Design for Manufacturability and Yield for Nano-Scale CMOS影响因子(影响力)学科排名<br> http://figure.impactfactor.cn/ifr/?ISSN=BK0268643<br><br> <br><br>书目名称Design for Manufacturability and Yield for Nano-Scale CMOS网络公开度<br> http://figure.impactfactor.cn/at/?ISSN=BK0268643<br><br> <br><br>书目名称Design for Manufacturability and Yield for Nano-Scale CMOS网络公开度学科排名<br> http://figure.impactfactor.cn/atr/?ISSN=BK0268643<br><br> <br><br>书目名称Design for Manufacturability and Yield for Nano-Scale CMOS被引频次<br> http://figure.impactfactor.cn/tc/?ISSN=BK0268643<br><br> <br><br>书目名称Design for Manufacturability and Yield for Nano-Scale CMOS被引频次学科排名<br> http://figure.impactfactor.cn/tcr/?ISSN=BK0268643<br><br> <br><br>书目名称Design for Manufacturability and Yield for Nano-Scale CMOS年度引用<br> http://figure.impactfactor.cn/ii/?ISSN=BK0268643<br><br> <br><br>书目名称Design for Manufacturability and Yield for Nano-Scale CMOS年度引用学科排名<br> http://figure.impactfactor.cn/iir/?ISSN=BK0268643<br><br> <br><br>书目名称Design for Manufacturability and Yield for Nano-Scale CMOS读者反馈<br> http://figure.impactfactor.cn/5y/?ISSN=BK0268643<br><br> <br><br>书目名称Design for Manufacturability and Yield for Nano-Scale CMOS读者反馈学科排名<br> http://figure.impactfactor.cn/5yr/?ISSN=BK0268643<br><br> <br><br>
勉强
发表于 2025-3-21 23:30:16
Book 2007ocess and how to address each aspect at the proper design step starting with the design and layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, mask planning, simulation an
Pageant
发表于 2025-3-22 04:06:30
Book 2007to the good practices that can enhance a design’s manufacturability and yield. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development..
conference
发表于 2025-3-22 05:57:46
Charles C. Chiang,Jamil KawaAddressing a new topic (DFM/DFY) critical at 90 nm and beyond.No book available today with comprehensive coverage of this topic.Book covers all CAD/CAE aspects of a SOC design flow
Melatonin
发表于 2025-3-22 10:20:26
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savage
发表于 2025-3-22 16:29:44
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savage
发表于 2025-3-22 21:07:44
978-90-481-7303-7Springer Science+Business Media B.V. 2007
枯萎将要
发表于 2025-3-22 22:22:46
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ELATE
发表于 2025-3-23 01:29:34
Systematic Yield - Chemical Mechanical Polishing (CMP),
epicondylitis
发表于 2025-3-23 06:06:58
Design for Manufacturability and Yield for Nano-Scale CMOS