Atheroma 发表于 2025-3-27 00:18:10
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Diamond Deposition onto Flat Substrates,bility and uniformity are key requirements. Diamond deposited onto silicon substrates has been widely researched using both microwave and hot filament chemical vapour deposition (CVD). In this chapter hot-filament CVD has been employed to deposit diamond onto flat substrates to prove that the procesMeasured 发表于 2025-3-27 07:18:21
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Controlling Structure and Morphology,sion onto the substrate material. These film characteristics are in turn controlled by a number of factors including the VFCVD reactor parameters such as substrate temperature, substrate bias, pressure, methane concentration, plasma characteristics and affinity of the substrate for diamond nucleationauseate 发表于 2025-3-27 14:04:00
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