重画只能放弃 发表于 2025-3-23 10:11:54

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confide 发表于 2025-3-23 17:20:11

Submitted on: 16 September 2012.
Revised on: 09 January 2013.
Accepted on: 08 March 2013.

___________________IEEE PHOTONICS TECHNOLOGY LETTERS

展览 发表于 2025-3-23 21:57:26

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条约 发表于 2025-3-24 01:12:54

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Ingrained 发表于 2025-3-24 05:57:11

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REP 发表于 2025-3-24 06:32:21

Submitted on: 16 October 2023.
Revised on: 13 November 2023.
Accepted on: 22 December 2023.

___________________IEEE PHOTONICS TECHNOLOGY LETTERS

MILL 发表于 2025-3-24 12:22:25

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其他 发表于 2025-3-24 14:54:05

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tackle 发表于 2025-3-24 19:06:14

Submitted on: 08 February 1999.
Revised on: 05 May 1999.
Accepted on: 23 May 1999.

___________________IEEE PHOTONICS TECHNOLOGY LETTERS

征服 发表于 2025-3-25 03:12:29

Submitted on: 16 September 2020.
Revised on: 23 November 2020.
Accepted on: 28 December 2020.

___________________IEEE PHOTONICS TECHNOLOGY LETTERS
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查看完整版本: SCIE期刊IEEE PHOTONICS TECHNOLOGY LETTERS 2024/2025影响因子:2.304 (IEEE PHOTONIC TECH L) (1041-1135). (PHYSICS, APPLIED)(应用物理